DRY CLEANING TIME DETERMINING SYSTEM, DRY CLEANING METHOD, AND DRY CLEANING SYSTEM OF SEMICONDUCTOR- MANUFACTURING APPARATUS, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a dry cleaning time determining system that automatically determines cleaning treatment in a semiconductor-manufacturing apparatus. SOLUTION: In dry cleaning, a deposition film deposited inside a reaction both 5 of a semiconductor-manufacturing apparatus is subjected to etching removal by a cleaning gas at least containing a halogen gas. The first invention is a system for automatically determining cleaning time. In the second invention, metal, a metal compound, an organic-based gas, or the like exists when removing a deposit film that is deposited in the reaction tank of the semiconductor- manufacturing apparatus for forming a CVD film or the like by the cleaning gas containing at least halogen gas, such as ClF3 . A selection ratio and the cleaning time are increased. The third invention is a system that carries out control for conducting efficient cleaning in the apparatus.