| 摘要 |
PROBLEM TO BE SOLVED: To correctly evaluate the position detection performance of an alignment mark. SOLUTION: The method comprises a step S102 of taking in signals a plurality of numbers of times from photoelectric conversion elements for calculating the positions of four marks, a step S103 of calculating the mark spacing from the mark positions, and a step S104 of driving a wafer stage microscopically, to determine whether a specified drive number of times for measurement is reached, and if it has not, the procedure returns to the step S102 to recalculate the mark spacing.
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