发明名称 PROCEDE ET APPAREIL A CONTRASTE DE TENSION POUR INSPECTER DES SEMI-CONDUCTEURS EN UTILISANT UN FAISCEAU DE PARTICULES A BASSE TENSION
摘要 <p>At least an interlaced picture frame of a first surface of a substrate is recorded using charge particles beam. A second surface of the substrate is loaded and imaging its first surface is imaged. The second surface locks up the first surface and that the registered image is compared with a reference in order to identify faults in the checked substrate. The subsystem image processor (66) forms a component of an acquired image processing electronics (80), which includes a control device (82) for the electron-optical column and a video digitizing device (84), an object table control device (86), an interferometer control device (88) for the object table position and the position return beam. A video output stage (90) supplies a picture signal to a control computer (60) for the display as well as a real time control computer (92) with a real-time operating system such as for example VxWorks or similar. An independent claim is included for: (a) a device for determination of faults in structures substrate</p>
申请公布号 FR2791776(B1) 申请公布日期 2003.03.14
申请号 FR20000000174 申请日期 2000.01.07
申请人 SCHLUMBERGER TECHNOLOGIES INC 发明人 LO CHIWOEI WAYNE;KANAI KENICHI
分类号 H01L21/66;G01N23/00;G01Q30/02;G01Q30/04;G01R31/265;G01R31/305;G01R31/307;G06K9/78;H01J37/28;(IPC1-7):G01R31/265 主分类号 H01L21/66
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