| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a substrate holding stage cleaning device and its cleaning method for preventing damage of a substrate by removing dust particles on a stage holding the substrate. SOLUTION: A vacuum nozzle 13 connected to a vacuum source 40 and an arm 12 provided with a brush 14 move on the substrate holding stage 2, and the brush 14 rubs to remove the dust particles on the stage 2. At the same time, the dust particles on the stage 2 are removed by sucking and discharging the removed dust particles through the vacuum nozzle 13 connected to the vacuum source.</p> |
