发明名称 Exposure apparatus, method of controlling same, and method of manufacturing devices
摘要 After scanning is started in an exposure apparatus, a wafer stage (5) is moved to a position (Ma) at which focus measurement is possible. When an initial focus measurement point (M0) has arrived at the spots (A) to (C) or (a) to (c), a storage cycle of a CCD sensor is initialized at a timing that is asynchronous with respect to a reference signal that is for controlling the wafer stage. As a result, the focus measurement point (M0) and an offset measurement point can be made to agree in a highly precise manner.
申请公布号 US2003048425(A1) 申请公布日期 2003.03.13
申请号 US20020235646 申请日期 2002.09.06
申请人 CANON KABUSHIKI KAISHA 发明人 IWANAGA TAKEHIKO
分类号 G01B11/00;G01B21/00;G01B21/02;G03B21/26;G03F7/207;G03F7/22;G03F9/02;H01L21/027;(IPC1-7):G03B21/26 主分类号 G01B11/00
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