| 摘要 |
Provided is a novel epoxy compound useful, in photolithography, as a monomer for preparing a photoresist material excellent in transparency and affinity to a substrate. More specifically, provided are an epoxy compound represented by the following formula (1): wherein, R1 and R2 each independently represents a hydrogen atom or a linear, branched or cyclic C1-10 alkyl group in which hydrogen atoms on one or more constituent carbon atoms thereof may be partially or entirely substituted by one or more halogen atoms, or the constituent -CH2- may be substituted by an oxygen atom, or R1 and R2 may be coupled together to form an aliphatic hydrocarbon ring; R3 represents a linear, branched or cyclic C1-10 alkyl group or a C1-15 acyl or alkoxycarbonyl group in which hydrogen atoms on one or more constituent carbon atoms thereof may be partially or entirely substituted by one or more halogen atoms; X represents CH2, oxygen or sulfur; k stands for 0 or 1; and m stands for an integer of 0 to 5; and a polymer compound having recurring units available therefrom.
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