Electrophotographic process and apparatus

摘要

In an electrophotographic process using an amorphous silicon photosensitive member which has a surface protective layer and effecting reverse development and cleaning with a cleaning blade, the surface moving speed PS (mm/sec) of the photosensitive member is 320 mm/sec or more and a film thickness and a specific resistance value of the surface protective layer are respectively Ds (mum) and Rs (OMEGA.cm) which fulfill the following conditions: 1.0x109<=Rs<=1.0x1013Ds<=-0.136Ln(Rs)+(-0.004xPS+6).