发明名称 PHOTOCURABLE FORM-IN-PLACE GASKET FOR ELECTRONIC APPLICATIONS
摘要 <p>Photocurable compositions and process for providing form-in-place gaskets using automated placement followed by photocuring of a pattern of a non-silicone composition comprising a liquid polyolefin oligomer, a reactive diluent, and a curative. The form-in-place gasket, after curing, has a level of total outgassing components of 10 (g/g to 45 (g/g. The curative responds to actinic radiation and heat, and may contain a photoinitiator. Optionally a photocurable, form-in-place gasket according to the present invention further comprises a thixotropic filler in an amount from 8.0 wt.% to 12.0 wt.%, and preferably comprises a fumed silica.</p>
申请公布号 WO2003021138(A1) 申请公布日期 2003.03.13
申请号 US2002026029 申请日期 2002.08.15
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