发明名称 Coating solution for forming transparent silica coating film and method for producing transparent silica coating film
摘要 The invention provides a coating solution for forming transparent silica coating film which solution is stable and can readily form comparatively thick silica coating film on a substrate through single application of the coating solution without use of an organic solvent. The invention also provides a method for producing transparent silica coating film. The coating solution comprising an aqueous solution contains at least one silicon compound which is selected from the group consisting of silicon oxide, silicic acid, and a silicic acid hydrate and which has been modified to have silanol groups; a strong organic base; and a water-soluble polymer, wherein the silicon compound is dissolved in the aqueous solution in presence of the strong organic base.
申请公布号 US2003047111(A1) 申请公布日期 2003.03.13
申请号 US20020242553 申请日期 2002.09.12
申请人 NIUME KAZUMA;UTIDA TAKASI 发明人 NIUME KAZUMA;UTIDA TAKASI
分类号 C09D1/04;C03C1/00;C03C17/25;C03C17/34;C09D1/00;C09D133/26;C09D139/00;(IPC1-7):C08L1/26;C09D101/26 主分类号 C09D1/04
代理机构 代理人
主权项
地址