发明名称 |
STRUCTURE AND METHOD OF CORRECTING PROXIMITY EFFECTS IN A TRI-TONE ATTENUATED PHASE-SHIFTING MASK |
摘要 |
A structure and method are provided for correcting the optical proximity effects on a tri-tone attenuated phase-shifting mask. An attenuated rim, formed by an opaque region and an attenuated phase-shifting region, can be kept at a predetermined width across the mask or for certain types of structures. Typically, the attenuated rim is made as large as possible to maximize the effect of the attenuated phase-shifting region while still preventing the printing of larger portions of the attenuated phase-shifting region during the development process. |
申请公布号 |
WO0250614(A3) |
申请公布日期 |
2003.03.13 |
申请号 |
WO2001US47687 |
申请日期 |
2001.11.30 |
申请人 |
NUMERICAL TECHNOLOGIES, INC. |
发明人 |
PIERRAT, CHRISTOPHE;ZHANG, YOUPING |
分类号 |
G03F1/00;G03F1/29;G03F1/32;G03F1/36;H01L21/027 |
主分类号 |
G03F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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