发明名称 |
Method and apparatus for inspecting pattern defects |
摘要 |
An apparatus for inspecting pattern defects on microscopic circuit patterns, with high resolution, comprises: an objective lens for detecting an image of a sample; UV laser beam illumination means for illuminating onto a pupil of the objective lens; a means for lowering coherency of the UV laser illumination; a detector of integration type; and a means for processing detected signal thereof.
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申请公布号 |
US2003048439(A1) |
申请公布日期 |
2003.03.13 |
申请号 |
US20020218463 |
申请日期 |
2002.08.15 |
申请人 |
YOSHIDA MINORU;MAEDA SHUNJI;SHIMODA ATSUSHI;SAKAI KAORU;OKABE TAKAFUMI |
发明人 |
YOSHIDA MINORU;MAEDA SHUNJI;SHIMODA ATSUSHI;SAKAI KAORU;OKABE TAKAFUMI |
分类号 |
G01N21/00;G01N21/95;G01N21/956;(IPC1-7):G01N21/00 |
主分类号 |
G01N21/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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