发明名称 |
Etch improved resist systems containing acrylate (or methacrylate) silane monomers |
摘要 |
A chemically amplified (CA) photoresist system wherein a terpolymer containing ketal/phenolic/silicon based sidechains is provided. Among other things, the terpolymers provide for improved bake technologies. In another aspect a process for lithographic treatment of a substrate by means of ketal/phenolic/silicon based compositions and corresponding processes for the production of an object, particularly an electronic component are provided.
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申请公布号 |
US2003049561(A1) |
申请公布日期 |
2003.03.13 |
申请号 |
US20010907392 |
申请日期 |
2001.07.17 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
ANGELOPOULOS MARIE;HUANG WU-SONG;JUNYAN DAI;KWONG RANEE W.;LANG ROBERT N.;MAHOROWALA ARPAN P.;MEDEIROS DAVID R.;MOREAU WAYNE M.;PETRILLO KAREN E. |
分类号 |
G03F7/038;G03F7/039;(IPC1-7):G03F7/004 |
主分类号 |
G03F7/038 |
代理机构 |
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地址 |
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