| 摘要 |
PROBLEM TO BE SOLVED: To manufacture a sputtering target consisting of titanium dioxide, which is suitable for direct current voltage sputtering, that is, has an electrical resistivity of less than 5 Ωcm, (preferably, less than 1 Ωcm), and which can be manufactured by a particularly inexpensive method to be simply operated with an easy handling technique, so as to be produced with a large number of fragmentations. SOLUTION: The method for manufacturing the electrically conductive titanium dioxide (TiO2 ) sputtering target with an electrical resistivity of less than 5 Ωcm, comprises mixing starting materials consisting of titanium dioxide with a doping agent or a mixture of doping agents, cold compacting it, and subsequently sintering it. |
