| 摘要 |
PROBLEM TO BE SOLVED: To provide a transfer film capable of preventing the generation of a pattern flaw due to bad photosensitivity by preventing adhesion of dust to a support film. SOLUTION: The transfer film is constituted of the support film, an inorganic particle-containing resin layer and a protective film and the transmissivity of radiation thereof is set to 50% or more by setting the surface resistivity of the support film and/or the protective film to 10<12>Ω/(square) or less to prevent the adhesion of dust due to static electricity.
|
