发明名称 PHENOLIC STAIN-RESISTS
摘要 <p>Polyamide fibrous substrates which resist staining by acid dyes, and processes for preparing the same which comprise applying, at pH 2 to 10, a base-catalyzed condensation product formed by the condensation reaction of a mixture of bis(hydroxyphenyl)sulfone and at least one other phenolic compound with formaldehyde to give a product known as a resole.</p>
申请公布号 EP0927273(B1) 申请公布日期 2003.03.12
申请号 EP19970942467 申请日期 1997.09.16
申请人 E.I. DU PONT DE NEMOURS AND COMPANY 发明人 BUCK, ROBERT, CRAIG
分类号 D06M15/41;(IPC1-7):D06M15/41 主分类号 D06M15/41
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