摘要 |
<p>The invention relates to compounds of the formula I R<1 >is H, A, Ar, Hal, -OH, -O-A, -CF3 or -OCF3; R<2 >and R<7 >are H or A; R<3 >is R<4>, R<5 >and R<6 >are in each case, independently of each other, H, A, Hal, -OH, -O-A, -CF3, -OCF3, -CN, -NH2, -A-NH2; A is C1-C6-alkyl; Ar is a substituent which is formed by an aromatic radical which is optionally substituted once, twice or three times by R<5 >and which has from 1 to 3 ring structures which are optionally fused with other ring structures to form a fused ring system; Het is a substituent which is formed by a heterocycle which has from 1 to 3 ring structures, with each ring structure being saturated, unsaturated or aromatic and being optionally fused with other ring structures to form a fused ring system, and the heterocycle possessing a total of from 1 to 4 N, O and/or S atoms in the ring structures and being optionally substituted by R<6>; Hal is F, Cl, Br or I; n is 2, 3, 4, 5 or 6 and to their use.</p> |