| 摘要 |
PROBLEM TO BE SOLVED: To realize an apparatus for plasma treatment, which facilitates designing on high-frequency power feeding. SOLUTION: An interconnection 4a for high-frequency power feeding penetrates through a variable valve 70 for adjusting exhaust of a vacuum chamber 2. The valve 70 has a structure of accommodating an inner cylinder 72 both ends of which are opened, so as to be rotatable in an outer cylinder 71 only one end of which is opened, and is penetrated by the interconnection 4a at a part of a closed end 71b of the outer cylinder 71. Thereby, the apparatus for easy designing on the high-frequency power feeding can be realized, because it facilitates detour around an electrode support part of the interconnection. |
