发明名称 METHOD FOR MANUFACTURING Al OR Al ALLOY SPUTTERING TARGET WITH FINE CRYSTAL GRAIN
摘要 PROBLEM TO BE SOLVED: To provide a method for manufacturing a sputtering target with fine crystal grains. SOLUTION: This method is characterized by manufacturing an ingot of Al or an Al alloy having a one-direction solidification structure, by applying continuous reversal oscillation or intermittent normal-rotation oscillation to a mold, which gives the mold horizontal rotation oscillation having an acceleration angle of the maximum angle of 5πrad/sec<2> or more and a rotation angle of 45 degrees or higher, while solidifying a molten metal in the mold sequentially from the lower part to the upper part, cold plastic working the obtained ingot of Al or the Al alloy having the one-direction solidification structure, along a parallel direction to a solidified direction of the one-direction solidification structure, thermally recrystallizing it, and subsequently cutting it into a predetermined shape and dimension.
申请公布号 JP2003073816(A) 申请公布日期 2003.03.12
申请号 JP20010259459 申请日期 2001.08.29
申请人 MITSUBISHI MATERIALS CORP 发明人 TANIGUCHI KENICHI;SAKAMOTO TOSHIO
分类号 B22D27/04;B22D27/08;C23C14/34;(IPC1-7):C23C14/34 主分类号 B22D27/04
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