发明名称 |
FORMING METHOD FOR THROUGH HOLE AND SUBSTRATE FORMED WITH THE THROUGH HOLE |
摘要 |
PROBLEM TO BE SOLVED: To provide a through hole forming method which can easily form even a through hole with a large aspect ratio (thickness of substrate/diameter of through hole). SOLUTION: A hole is bored in a glass substrate with a drill and chamfered with a polishing drill (Fig. 2 (a) to (c)). Then a conductor is supplied by a conductor supplier 206 and cut to previously calculated length (length long enough to fill the through hole with the conductor) (Fig. 2 (d) to (e)). The cut conductor is compressed from above and below into a rivet shape (Fig. 2 (f)). |
申请公布号 |
JP2003075859(A) |
申请公布日期 |
2003.03.12 |
申请号 |
JP20010265182 |
申请日期 |
2001.09.03 |
申请人 |
MIWA ENGINEERING:KK;ARUTEA SOLUTIONS:KK |
发明人 |
ASADA NORIHIRO |
分类号 |
G02F1/1345;G09F9/00;H01L23/15;H05K1/11;H05K3/40;H05K3/46;(IPC1-7):G02F1/134 |
主分类号 |
G02F1/1345 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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