发明名称 FILM THICKNESS MEASURING METHOD AND DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a film thickness measuring method and a device capable of measuring online accurately even if irregularities exist on the surface. SOLUTION: This film thickness measuring device 1 is characterized by having a first light source 2 for irradiating a film to be measured with light having a first wavelength, a first incident light photodetector 8 for measuring the intensity of incident light having the first wavelength, a first transmitted light photodetector 8 for measuring the intensity of transmitted light having the first wavelength, a first comparator for determining a first ratio which is the ratio between the intensity of incident light having the first wavelength and the intensity of transmitted light, a second light source 4 for irradiating light having a second wavelength different from the first wavelength, a second incident light photodetector 10 for measuring the intensity of incident light having the second wavelength, a second transmitted light photodetector 10 for measuring the intensity of transmitted light having the second wavelength, a second comparator for determining a second ratio which is the ratio between the intensity of incident light having the second wavelength and the intensity of transmitted light, and a film thickness calculator 12 for determining the film thickness based on the first ratio and the second ratio.
申请公布号 JP2003075126(A) 申请公布日期 2003.03.12
申请号 JP20010269339 申请日期 2001.09.05
申请人 MITSUBISHI HEAVY IND LTD 发明人 KURODA MASAHIRO;SASAGAWA EISHIRO;UENO MOICHI;MIYAZONO NAOYUKI
分类号 G01B11/06;(IPC1-7):G01B11/06 主分类号 G01B11/06
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