发明名称 FLUID CONTROLLER, HEAT TREATMENT DEVICE AND FLUID CONTROL METHOD
摘要 PROBLEM TO BE SOLVED: To reduce a cost by commonly using a plurality of gas lines, to implement compactness by reducing the number of the gas lines, and to facilitate expansion of gas kinds. SOLUTION: In this fluid controller 11, the single-system fluid supply line 13 is provided with a flow controller 13g, a pressure control system area 14 is provided on the upstream side of the flow controller 13g, the single-system line 13 of the pressure control system area 14 is connected with a plurality of fluid supply sources A, B, C, and a nearly L-shaped extension line 15 extended on this side in a view from the front of the single-system line 13 of the pressure control system area 14 is provided to coaxially configure the single-system line 13. The extension line 15 is formed with a plurality of fluid supply ports 16a, 16b, 16c connected to the fluid supply sources A, B, C.
申请公布号 JP2003074800(A) 申请公布日期 2003.03.12
申请号 JP20010261047 申请日期 2001.08.30
申请人 TOKYO ELECTRON LTD 发明人 OKABE YASUYUKI;OKURA NARIYUKI
分类号 F17D3/03;F17D1/04;H01L21/205;(IPC1-7):F17D3/03 主分类号 F17D3/03
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