| 摘要 |
PROBLEM TO BE SOLVED: To provide a metal vapor deposition apparatus which can improve operation efficiency, and greatly shorten an operation time. SOLUTION: This metal vapor deposition apparatus comprises an evaporation part 1 for sequentially evaporating a metallic wire rod 5 of a predetermined dimension in a case C of a vacuum state, and a supplying part 2 for sequentially supplying the metallic wire rod 5 to the evaporation part 1, while forming the metallic wire rod 5 by cutting a wire-shaped raw material 6 into the predetermined dimension in the case C of the vacuum state.
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