| 摘要 |
<p>PROBLEM TO BE SOLVED: To restrain detection precision of a defect from being lowered by reflection of irradiated light due to an image-focusing lens or the like, when the defect is detected by irradiation of the light, in a photomask formed with fine patterns. SOLUTION: A light-reflection preventing film is provided between a photomask substrate of an inspection object and a photodetector for detecting transmission light transmitted through the photomask substrate to remove a noise such as reflected light, and the defect is detected at high precision thereby.</p> |
