VESSEL FOR HIGH PURITY CHEMICAL MATERIAL AND ITS LIQUID SURFACE MEASURING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a vessel for high purity chemical material facilitating cleaning while refilling or updating the content and avoiding generation of contamination matter or particulate material during liquid surface detection. SOLUTION: The vessel contains an ultrasonic liquid surface sensor 24 attached to the outer bottom surface for measuring the quantity of high purity chemical material in the vessel 10, a dipping pipe 22 for supplying high purity chemical material from the vessel and supplying the vessel 10 with pressurized gas for supplying chemical material, a liquid reservoir on the bottom surface 16 where the lower tip end of the dipping pipe 22 is positioning and having the size with a detection zone for the ultrasonic liquid surface sensor 24 for measuring the quantity of the high purity chemical material. In the vessel the ultrasonic liquid level sensor 24 positions adjacent to the liquid reservoir 20 for measuring the quantity of the chemical material in the liquid reservoir 20.