| 发明名称 |
SUBSTRATE WITH A REDUCED LIGHT-SCATTERING, ULTRAPHOBIC SURFACE AND A METHOD FOR THE PRODUCTION OF THE SAME |
| 摘要 |
The invention relates to a substrate with a reduced light-scattering, ultraphobic surface, to a method for the production of said substrate and to the use thereof. The substrate with a reduced light-scattering, ultraphobic surface has a total scatter loss <=7%, preferably <=3% and especially <=1% and a contact angle in relation to water of >=140°, preferably >=150°. |
| 申请公布号 |
EP1289899(A1) |
申请公布日期 |
2003.03.12 |
| 申请号 |
EP20010943441 |
申请日期 |
2001.05.23 |
| 申请人 |
SUNYX SURFACE NANOTECHNOLOGIES GMBH |
发明人 |
REIHS, KARSTEN;DUPARR , ANGELA;NOTNI, GUNTHER |
| 分类号 |
B32B9/00;B32B17/06;C03C17/38;C03C17/42;C04B41/89;C04B41/90;C23C26/00;(IPC1-7):C03C17/38;C09K3/18;C08J7/04;C04B41/81 |
主分类号 |
B32B9/00 |
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