| 摘要 |
PROBLEM TO BE SOLVED: To provide a apparatus and method of forming a thin film in which the futile use of a material is suppressed, the uniform thin film is formed and the thin film is formed using a high viscous coating liquid by applying an ink jet coating method, equipment and a method of manufacturing a liquid crystal device and the liquid crystal device, and an apparatus and a method of manufacturing a thin film structure and the thin film structure. SOLUTION: The thin film forming apparatus 1 is for forming the thin film by applying the coating liquid L prepared by dissolving or dispersing a film material in a solvent on a substrate SUB. The apparatus is provided with an ink jet structure 3 having an ink head 2 discharging the coating liquid L on the substrate SUB, a moving structure 4 for moving a position of the ink jet head 2 and a position of the substrate SUB relatively, a control part C for controlling at least one of the ink jet structure 3 and the moving structure 4 and a thermal chamber 5 for heating the coating liquid L and the substrate SUB to a temperature equal to or above a room temperature.
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