发明名称 Substrate processing pallet and related substrate processing method and machine
摘要 A substrate processing pallet has a top surface and a plurality of side surfaces. The top surface has at least one recess adapted to receive a substrate. The recess includes a support structure adapted to contact a portion of a substrate seated in the recess and a plurality of apertures each adapted to accommodate a lift pin. Lift pins can extend through the apertures initially to support the substrate and retract to deposit the substrate onto the support structure. A side surface includes a process positioning feature adapted to engage with a feature located in a process chamber to position the pallet. A side surface includes a positioning feature adapted to engage with an end effector alignment feature to position the pallet with respect to the end effector during transport. A side surface includes support features adapted to engage with end effector support features to support the pallet during transport.
申请公布号 US6530733(B2) 申请公布日期 2003.03.11
申请号 US20010917223 申请日期 2001.07.27
申请人 NEXX SYSTEMS PACKAGING, LLC 发明人 KLEIN MARTIN P.;FELSENTHAL DAVID;SFERLAZZO PIERO
分类号 B65G49/07;C23C14/50;H01L21/673;H01L21/68;(IPC1-7):B65G49/07 主分类号 B65G49/07
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