发明名称 |
Method of preserving photosensitive composition |
摘要 |
A practically excellent method for preserving a photosensitive composition Containing a photopolymerization initiator and a photopolymerizable monomer and/or oligomer, which comprises placing and preserving the photosensitive composition in a light shielding vessel, wherein the product of the void ratio (%) in the vessel and the oxygen partial pressure (hPa) in the void part is 1500 (%.hPa) or more is provided; and the method imparts remarkably improved preservation stability.
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申请公布号 |
US6531521(B2) |
申请公布日期 |
2003.03.11 |
申请号 |
US20010835337 |
申请日期 |
2001.04.17 |
申请人 |
SUMITOMO CHEMICAL COMPANY, LIMITED |
发明人 |
BABA KOJI;INOUE TOSHIYA;HOZUMI SHIGEO |
分类号 |
C07B63/00;C08F2/46;C08F2/50;C08F20/00;C08K3/00;C08K5/00;C08K5/3492;C08L101/00;G03F7/029;G03F7/031;G03F7/26;(IPC1-7):C08F2/46 |
主分类号 |
C07B63/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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