发明名称 Method of preserving photosensitive composition
摘要 A practically excellent method for preserving a photosensitive composition Containing a photopolymerization initiator and a photopolymerizable monomer and/or oligomer, which comprises placing and preserving the photosensitive composition in a light shielding vessel, wherein the product of the void ratio (%) in the vessel and the oxygen partial pressure (hPa) in the void part is 1500 (%.hPa) or more is provided; and the method imparts remarkably improved preservation stability.
申请公布号 US6531521(B2) 申请公布日期 2003.03.11
申请号 US20010835337 申请日期 2001.04.17
申请人 SUMITOMO CHEMICAL COMPANY, LIMITED 发明人 BABA KOJI;INOUE TOSHIYA;HOZUMI SHIGEO
分类号 C07B63/00;C08F2/46;C08F2/50;C08F20/00;C08K3/00;C08K5/00;C08K5/3492;C08L101/00;G03F7/029;G03F7/031;G03F7/26;(IPC1-7):C08F2/46 主分类号 C07B63/00
代理机构 代理人
主权项
地址
您可能感兴趣的专利