发明名称 VACUUM TREATMENT APPARATUS
摘要 PROBLEM TO BE SOLVED: To form a gas atmosphere of a predetermined pressure in a short time. SOLUTION: This vacuum treatment apparatus 10 has a vacuum tank 11 and a gas introducing system 30, and a gas buffer system 40 and a vacuum exhaust system 20 are connected to the vacuum tank 11. Gas with a set pressure is preliminarily stored in a buffer tank 41 of the gas buffer system 40 and, when the vacuum tank 11 held to a high vacuum state and the buffer tank 41 are connected, the gas in the buffer tank 41 flows in the vacuum tank 11 by pressure difference to raise the pressure in the vacuum tank 11 in a short time.
申请公布号 JP2003071270(A) 申请公布日期 2003.03.11
申请号 JP20010262726 申请日期 2001.08.31
申请人 ULVAC JAPAN LTD 发明人 SUESHIRO SEISUKE;SHISHIKURA MASATO;TSUGUEDA TAKAYUKI;OZORA HIROKI
分类号 B01J3/00;B01J3/02;C23C14/00;C23C16/455;(IPC1-7):B01J3/00 主分类号 B01J3/00
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