COATING APPARATUS AND METHOD FOR OPERATING THE SAME

摘要

PURPOSE: A coating apparatus and a method for operating the same are provided to reduce an unnecessary work time by removing effectively air in an exchanging process of a coating solution vessel. CONSTITUTION: A nozzle(107) is used for injecting a coating solution(101) to a semiconductor substrate. A coating solution vessel(100) is used for storing the coating solution(101). A buffer vessel(104) is arranged between the coating solution vessel(100) and the nozzle(107) in order to prevent permeation of air into the nozzle(107). A mass flow sensor(103) is arranged between the coating solution vessel(100) and the buffer vessel(104) in order to monitor the absence or the presence of the coating solution(101). An exhaust tube(113) and an exhaust valve(105) are connected with the buffer vessel(104). A pressure tube(114) and a pressure valve(102) are connected with the coating solution vessel(100). A control portion(120) controls operations of the mass flow sensor(103), the pressure valve(102), and the exhaust valve(105).