PHOTORESIST COATING APPARATUS FOR FABRICATING SEMICONDUCTOR DEVICE AND METHOD FOR DRIVING THE SAME

摘要

PURPOSE: A photoresist coating apparatus for fabricating a semiconductor device and a method for driving the same are provided to prevent defects such as a liquefied solvent or a crystalline solvent including photoresist formed on a wafer by stopping the rotation of a spin chuck after rotating the spin chuck. CONSTITUTION: A chamber(4) has an opened upper portion and a lower portion including a through-hole(36) and a plurality of pumping lines(32,34). A rotary barrel(50) is installed in the inside of the chamber(4). A rotary barrel rotation portion is used for rotating the rotary barrel(50). A spin chuck(40) is installed in the inside of the rotary barrel(50) in order to fix and rotate a wafer. An injection nozzle(46) is installed at an upper portion of the chamber(4). The injection nozzle(46) is shifted to a home position and a process position. An air supply device(48) is installed at an upper portion of the chamber(4) in order to supply the air into the chamber(4).