发明名称 |
SEMICONDUCTOR FABRICATION APPARATUS |
摘要 |
PURPOSE: A semiconductor fabrication apparatus is provided to prevent an adhesion of contaminants on an inner wall of a door by using an anti-electrostatic material when the door of a chamber is opened. CONSTITUTION: A door(100) of a process chamber is opened when wafers are transferred from a wafer cassette to the process chamber. The door(100) of the chamber is closed when a fabrication process is performed. A partition(110) is installed on an inner side of the door(100). The partition(110) is formed with an anti-electrostatic material. In addition, the partition(110) is formed with a transparent material. The partition(110) is use for covering a part of the door(100) or an exposed region of the door(100). The partition(110) can be formed with vinyl.
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申请公布号 |
KR20030020549(A) |
申请公布日期 |
2003.03.10 |
申请号 |
KR20010053689 |
申请日期 |
2001.09.01 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
KIM, TAE DONG;LEE, GYEONG SU |
分类号 |
H01L21/02;(IPC1-7):H01L21/02 |
主分类号 |
H01L21/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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