发明名称 SEMICONDUCTOR FABRICATION APPARATUS
摘要 PURPOSE: A semiconductor fabrication apparatus is provided to prevent an adhesion of contaminants on an inner wall of a door by using an anti-electrostatic material when the door of a chamber is opened. CONSTITUTION: A door(100) of a process chamber is opened when wafers are transferred from a wafer cassette to the process chamber. The door(100) of the chamber is closed when a fabrication process is performed. A partition(110) is installed on an inner side of the door(100). The partition(110) is formed with an anti-electrostatic material. In addition, the partition(110) is formed with a transparent material. The partition(110) is use for covering a part of the door(100) or an exposed region of the door(100). The partition(110) can be formed with vinyl.
申请公布号 KR20030020549(A) 申请公布日期 2003.03.10
申请号 KR20010053689 申请日期 2001.09.01
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 KIM, TAE DONG;LEE, GYEONG SU
分类号 H01L21/02;(IPC1-7):H01L21/02 主分类号 H01L21/02
代理机构 代理人
主权项
地址