| 摘要 |
PURPOSE: A method for manufacturing an optical device is provided to reduce the manufacturing time and the manufacturing cost by forming grooves where optical fibers are to be arranged and forming an optical waveguide. CONSTITUTION: A mask layer made of a silicon nitride is formed on a silicon substrate(11). The mask layer is patterned through the photolithography to expose a region of the silicon substrate(11) where an optical fiber(20) is to be arranged. The patterned mask layer is etched to form a first groove. Then, the patterned mask layer is removed. The first groove has a V shape. A lower cladding layer(14) and a core layer are sequentially formed on the front lower of the silicon substrate(11) where the first groove has been formed. An optical waveguide(15a) is formed on a region that is located on a straight line from the first groove by patterning the core layer. An upper cladding layer(16) is formed on the front surface including the optical waveguide(15a). The upper and lower cladding layers(16,14) are removed to expose the silicon substrate(11). A second groove is formed on a region where the optical waveguide(15a) is connected to an optical fiber block. The optical fiber(20) is arranged on the first groove and then coupled to the optical waveguide(15a).
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