METHOD AND APPARATUS FOR PERFORMING CLEANING AND DRYING PROCESS

摘要

PURPOSE: A method and an apparatus for performing a cleaning and drying process are provided to prevent generation of a water mark on a substrate by performing effectively a drying process. CONSTITUTION: A substrate is loaded on an upper portion of a spin chuck(S100). The spin chuck is rotated under 10 to 50rpm and the first cleaning process is performed by using a chemical cleaning solution(S200). The spin chuck is rotated under 100 to 300rpm and the first rinsing process is performed by using deionized water(S300). The spin chuck is rotated under 10 to 50rpm and the second cleaning process is performed by using a diluted HF solution(S400). The spin chuck is rotated under 100 to 300rpm and the second rinsing process is performed by using the deionized water(S500). The spin chuck is rotated under 200 to 500rpm and the first dry process is performed by using a pure gas or the first dry gas(S600). The spin chuck is rotated under 200 to 500rpm and the second dry process is performed by using the second dry gas(S700). The substrate is unloaded from the spin chuck(S800).