| 摘要 |
<p>PROBLEM TO BE SOLVED: To enable accurate inspection by preventing a pattern image from being eclipsed, when a strut part of a stencil mask becomes an obstacle, in defect inspection of a pattern formed in a stencil mask. SOLUTION: The stencil mask contains a base layer and a silicon film. The base layer has an outer peripheral part and a plurality of strut parts, which divide the inside surrounded by the outer peripheral part into a plurality of collective aperture parts. The silicon layer has an insulating layer formed on a surface of the base layer, and a pattern-forming region which is formed on the insulating layer. In the pattern-forming region, the respective patterns for transfer are formed into batch aperture parts. The thickness of a plurality of arbitrarily selected strut parts from among the strut parts is made smaller than the thickness of the outer peripheral part.</p> |
