SUBSTRATE PROCESSING APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide a substrate processing apparatus capable of satisfactorily preventing a substrate from being charged, while keeping the substrate clean. SOLUTION: A gas-liquid mixing apparatus 130 mixes pure water, supplied from a pure water supplying apparatus 140 via (a) pure water supplying pipe a with a carbonic acid gas supplied from a carbonic acid gas supplying apparatus 150 via a carbonic acid gas supplying pipe (b), thereby preparing a cleaning liquid. The cleaning liquid prepared by the apparatus 130 is supplied to a back rinse nozzle 125 of a developer 120 via a cleaning liquid supplying pipe (c) and is discharged on the rear surface of a substrate 121 held by a substrate- holding section 123.