| 摘要 |
PROBLEM TO BE SOLVED: To provide a rinsing type automatic substrate-cleaning apparatus which can exclude generation of oxygen which causes occurrence of watermarks and fill an inert gas, so that the occurrence of the watermarks is prevented. SOLUTION: The automatic substrate-cleaning apparatus 1 has a chemical liquid bath 10 for cleaning a substrate 2, running water baths 20, 30, a rotating substrate drying device 40, a standby stage 50 for removing the substrate 2. The device 40 is provided with a rotating chamber 41 for housing a plurality of substrates 2 and rotating them, and a gas supplying means for controlling the number of particles and supplying a gas, whose oxygen concentration is controlled, to the chamber 41.
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