| 摘要 |
PROBLEM TO BE SOLVED: To provide technology which enables easy replacement of filters, while preventing the decline in productivity caused by the replacement of filters. SOLUTION: In a method for manufacturing a semiconductor device where processes are conducted by a manufacturing equipment provided with filters, a plurality of filters are prepared in an airtight filter unit. After a predetermined portion of processes by the manufacturing equipment is continued by using one of the plurality of filters, the filter which has been used is replaced with another in airtight state, and then processes are restarted. This structure enables easy replacement of the filters, with the replacement of the filters being done with an exhaust section being kept in airtight state. Consequently, confirmation of the vacuum level after the replacement of the filters and a test operation for checking various parameters becomes unnecessary, and productivity is improved.
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