发明名称 SEMICONDUCTOR STORAGE DEVICE AND ITS MANUFACTURING METHOD, AND RECOGNITION PATTERN MASK AND METHOD FOR SPECIFYING MEMORY CELL POSITION
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor storage device capable of rapidly and accurately specifying a fault address position of a physical memory cell from fault address information and a method for manufacturing the same, and to provide an optical recognition pattern and a method for using the same. SOLUTION: Repeating patterns 11 of the memory cell indicated by broken lines are laid out on a semiconductor substrate 10. A wiring layer, not shown and regarding the memory cell, is formed in a multilayer via an interlayer insulating film, and a protective film (passivation film) 12 is formed thereon. An optically recognizable film pattern PTN showing a position corresponding to the pattern on the one memory cell is formed under the protective film.
申请公布号 JP2003068986(A) 申请公布日期 2003.03.07
申请号 JP20010260111 申请日期 2001.08.29
申请人 SEIKO EPSON CORP 发明人 SHISHIKURA ISAO
分类号 H01L27/10;(IPC1-7):H01L27/10 主分类号 H01L27/10
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