| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a vapor phase growth system which can suppress the generation of particles, and to provide a method for mounting and demounting a wafer. SOLUTION: In mounting and demounting wafers in counterbores formed in a susceptor 10, a vapor phase growth system 1 is so structured that the susceptor 10 is exposed above a reaction furnace 32 which constitutes a bell-jar 30 and a gas ring 31. A fall-preventing board 11 is provided which moves in non-contact manner with the lower surface of the susceptor 10, exposed above the reaction furnace 32 and the gas ring 31 provided in the upper edge of the bell-jar 30, and covers a part below the susceptor 10.</p> |
