| 摘要 |
PROBLEM TO BE SOLVED: To provide a vacuum processor where a substrate is raised upward during plasma processing and electricity can be removed on the surface and the rear face of the substrate without sacrificing processing time and the reliability of an operation, and the position of the substrate is regulated without adding a driving source. SOLUTION: In the vacuum processor, an arm mechanism 32 and substrate upper/lower mechanisms 18 to 23 are driven by one driving source 5. The processor is provided with first and second transmission mechanisms 4 and 28 to 31 transmitting driving force to the substrate upper/lower mechanisms 18 to 23 from driving sources 26 and 27 apart from the driving source 5. The controller is also provided with a substrate positioning mechanism which mechanically works with the substrate upper/lower mechanisms 18 to 23, is driven by the driving source 5 in a way similar to the substrate upper/lower mechanisms 18 to 23 and regulates the position of the substrate in a reaction chamber. |
