| 摘要 |
PROBLEM TO BE SOLVED: To provide a aligner of high practicality that has reduced running cost and is provided with a high-reliability small-sized recovering device capable of recovering reusable gas. SOLUTION: This aligner transfers the pattern of a mask 2 to the surface of a substrate, by projecting exposing light of <=300 nm in wavelength upon the mask 2. This system is provided with a gas supplying apparatus B, which supplies a gas having high coefficient of thermal conductivity and/or high transmittance and a gas-recovering device C using a gas-separating film 17 for recovering the gas in at least part of the optical path of the exposure light. The gas recovered by means of the gas-recovering device C has purity of >=99.95% and the device C recovers the gas at a recovery rate of >=50%.
|
