发明名称 MANUFACTURING METHOD OF SHADOW MASK
摘要 PROBLEM TO BE SOLVED: To provide a manufacturing method of shadow mask never causing a diameter failure of pore by forming an etching corrosion-resisting resin layer without leaving bubbles in a pore in the formation of the etching corrosion- resisting resin layer on the pore side in the manufacturing method of a shadow mask by photeteching. SOLUTION: The metal surface within the pore is subjected to a surface treatment with plasma to form a micro rough surface 40, and an etching corrosion-resisting resin is applied to form the etching corrosion-resisting resin layer 47. Otherwise, the metal surface within the pore is subjected to a surface treatment by electrolysis to form the micro rough surface 40, and the etching corrosion-resisting resin is applied to form the etching corrosion-resisting resin layer 47.
申请公布号 JP2003068191(A) 申请公布日期 2003.03.07
申请号 JP20010257686 申请日期 2001.08.28
申请人 TOPPAN PRINTING CO LTD 发明人 TANAKA SHOJI;TAKADA KAZUHIRO
分类号 C23F1/00;C23F4/00;H01J9/14;(IPC1-7):H01J9/14 主分类号 C23F1/00
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