| 摘要 |
PROBLEM TO BE SOLVED: To shorten the length of the optical path of an optical system for forming a linear shape beam, since footprint is increased by much elongating the optical path, when the length of the linear shape beam is made into 300 nm to 1,000 nm or more, even through it is necessary to develop a much longer linear shape beam as the output of laser oscillators becomes higher in the laser anneal process of a semiconductor film. SOLUTION: The length of the optical path of the optical system is made as short as possible, and in order to make only the length of the linear shape beam long, it is better to make the semiconductor film have a curvature radius in the lengthwise direction of the linear shape beam. When the size of the linear shape beam is 1 m×0.4 mm, for example, the length of the optical path of the optical system is required for about 10 m, but when a radius of curvature of 40,000 mm is applied to a semiconductor film 11, the length of the optical path of the optical system can be halved, down to approximately 5 m, and a linear shape beam 1110 having a very uniform energy distribution can be provided.
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