PLASMA TREATMENT APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide a plasma-treatment apparatus which can stabilize the temperature of a chamber wall before and after the maintenance and suppress the defective processing caused by the change in the chamber wall temperature or its temperature distribution due to the variation of the gap between the chamber wall and a heater block in the individual apparatus. SOLUTION: The stabilization of the surface temperature of the chamber wall 35 before and after the maintenance and the uniformity of the surface temperature distribution of the chamber wall 35 are made possible by making the chamber wall 35 of a plasma-resistant conductive film and directly applying the voltage to the chamber wall 35 to make it work as a heater.