发明名称 ARRANGEMENT FOR GENERATING AN ACTIVE GAS JET
摘要 The invention is directed to an arrangement for generating a chemically active jet (active gas jet 6) by means of a plasma generated by electric discharge in a process gas (1). It is the object of the invention to find a novel possibility for generating a chemically active jet by means of a plasma generated by electric discharge in which high chemical activity develops at increased process gas velocity of the active gas jet (6) on the surface (7) to be treated and is electrically neutral already at the output of the arrangement, so that it does not pose a threat to the operating personnel, the environment and the treated surface. This objec t is met according to the invention in that the discharge chamber (2) has a conically narrowed end (21) for increasing the velocity of the active gas jet (6), and a limiti ng channel (4) for preventing propagation of the discharge zone (22) into the free spac e for the surface (7) to be treated is arranged following the narrowed end (21) of the discharge chamber (2). The limiting channel (4) is essentially cylindrical and is grounded and its length is greater than its cross section by a factor of 5 to 10.
申请公布号 CA2399493(A1) 申请公布日期 2003.03.07
申请号 CA20022399493 申请日期 2002.08.22
申请人 TEPLA AG 发明人 KONAVKO, ARKADY;SCHMID, HERMANN;KONAVKO, RUDOLPH
分类号 H05H1/30;H05H1/34;(IPC1-7):C23C8/36;H05H1/02 主分类号 H05H1/30
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