| 摘要 |
In an active matrix substrate of the IPS system, the present invention performs patterning of a protective film covering a TFT using a photosensitive resin based on an acrylic resin, and uses the acrylic resin as it is as a leveling layer after opening the protective film. Therefore, the leveling layer can be formed on the protective film without increasing the number of steps and suppressing the rubbing non-uniformity becomes possible.
|
