发明名称 Semiconductor memory device and method for manufacturing the same
摘要 A semiconductor memory device of the present invention includes: a semiconductor substrate; a memory cell capacitor for storing data, including a first electrode provided above the semiconductor substrate, a capacitance insulating film formed on the first electrode, and a second electrode provided on the capacitance insulating film; a step reducing film covering an upper surface and a side surface of the memory cell capacitor; and an overlying hydrogen barrier film covering the step reducing film.
申请公布号 US2003042522(A1) 申请公布日期 2003.03.06
申请号 US20020053693 申请日期 2002.01.24
申请人 MIKAWA TAKUMI;KUTSUNAI TOSHIE;JUDAI YUJI 发明人 MIKAWA TAKUMI;KUTSUNAI TOSHIE;JUDAI YUJI
分类号 H01L27/105;H01L21/02;H01L21/8242;H01L21/8246;H01L27/108;H01L27/115;(IPC1-7):H01L27/108;H01L29/04;H01L29/76;H01L29/94 主分类号 H01L27/105
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