发明名称 Power transistor, semiconductor substrate for devices and method for manufacturing same
摘要 A power transistor includes an n+ Si substrate, which has a surface intended for deposition, which is cleaned by wet chemical cleaning and further cleaned by vacuum heated cleaning, an n- Si buffer layer, which is deposited on the Si substrate as a deposition by CVD to cover impurities remaining on the surface intended for deposition, a p SiGe base layer, which is deposited as a deposition on the Si buffer layer by CVD, an n Si emitter layer on the SiGe base layer, a base electrode, an emitter electrode, and a collector electrode.
申请公布号 US2003042480(A1) 申请公布日期 2003.03.06
申请号 US20020225195 申请日期 2002.08.22
申请人 HIROSE FUMIHIKO 发明人 HIROSE FUMIHIKO
分类号 H01L21/205;H01L21/306;H01L21/331;H01L29/165;H01L29/73;H01L29/737;(IPC1-7):H01L29/06 主分类号 H01L21/205
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