APPARATUS AND METHODS FOR ELECTROCHEMICAL PROCESSING OF MICROELECTRONIC WORKPIECES

摘要

An apparatus and method for electrochemical processing of microelectronic workpieces in a reaction vessel (204). The reaction vessel includes: an outer container (220) having an outer wall (222); a fist outlet configured to introduce a primary flow into the outer container and at least one second outlet configured to introduce a secondary flow into the outer container separate from the primary flow; a dielectric field shaping unit (500) in the outer container receiving the secondary flow from the second outlet, the field shaping unit being configured to contain the secondary flow separate from the primary flow, and the field shaping unit having at least one electrode compartment (520) through which the secondary flow can pass; an electrode (600) in the electrode compartment; and an interface member (700) carried by the field shaping unit downstream from the electrode and configured to prevent selected matter of the secondary flow from passing to the primary flow.